Ultrasonic cleaning tank metrology keeps your wafer cleaning on track

  • R&D : Determine Key Ultrasonic Cleaning Process Parameters
  • Production : Maintain Process Windows by Monitoring Ultrasonic Cleaning
  • Tool Qual : Set Cleaning Tank Energy Levels
  • Preventive Maintenance : Check Acoustic Uniformity Inside Cleaning Tanks


  • September 14, 2017 – Onda to Present Cavitation Study from Dual 3+5 MHz Nozzle at SPIE BACUS Conference in Monterey, CA. Read more
  • Photomask January 31, 2017 – Onda to Exhibit at Semicon Korea 2017 with Woowon Technologies. Read more
  • October 25-27, 2016 – Onda’s Partner, Technett, to Exhibit at Semicon Europa in Grenoble, France. Read more
  • Ultrasonic / Megasonic Cleaning Tank and Cavitation Measurement Equipment Downloads