News

PMLogo

Onda to Present Cavitation Study for a Dual Nozzle Transducer for Photomask Cleaning

September 14, 2017 – Onda is pleased to present at the SPIE BACUS conference in Monterey, CA.  Onda shared a study on the acoustic cavitation performance from a dual (3+5 MHz) nozzle transducer for photomask cleaning.

To review the presentation material, please visit HERE.

SemiconKorea2017

Onda to Exhibit at Semicon Korea 2017 with Woowon Technologies

January 31, 2017 – Onda is pleased to exhibit with Woowon Technologies in booth 2406 at Semicon Korea. Onda will showcase a new photomask sensor with the MCT-2000 to monitor the acoustic cavitation performance in photomask cleaning.

To review studies that acoustically characterized photomask cleaning processes, please visit HERE to access a technical poster presented at the 2016 SPIE Photomask.

Semicon Europa

Onda’s Sales Partner, Technett, to Exhibit at Semicon Europa

October 25-27, 2016 – Onda is pleased to announce that Technett, Onda’s sales partner in France, will be exhibiting at Semicon Europa in Grenoble, France.

Please stop by booth 1014 to say hello and receive a demonstration of the MCT-2000 cavitation meter.  To schedule an appointment or to learn more about Technett, please visit their website.

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Onda to Present Acoustic Measurements of 3 MHz Transducers for Mask Cleaning

September 12-14, 2016 – Onda is pleased to collaborate with Honda Electronics, SUSS MicroTec, and the University of Arizona to present a study which evaluates the acoustic performance for two 3 MHz transducers used for photomask megasonic cleaning.

The poster is titled:

Acoustic Characterization of Two Megasonic Devices for Photomask Cleaning
Paper 9985-74
Author(s): Claudio Zanelli, Xi Chen, Onda Corp. (United States); Manish Keswani, The Univ. of Arizona (United States); Nagaya Okada, Honda Electronics Co., Ltd. (Japan); Jyhwei Hsu, SUSS MicroTec (Taiwan) Co., Ltd. (Taiwan); Petrie H. Yam, Onda Corp. (United States)

Abstract:

New methods to measure stable and transient cavitation were applied to two megasonic cleaning devices. One is a novel design consisting of a transducer coupled to a tilted, truncated quartz cone with a 4 x 6 cm elliptical flat surface, coupled with the substrate by cleaning fluid infused through the cone. The second device is a spot shower that uses a smooth jet of cleaning fluid to convey the sound. Results of the measurements, acoustic maps and schlieren imaging are used to explain the cleaning performance of each device.

To download the poster, please visit the Resources page HERE.

For more information about the symposium, please visit HERE.

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Onda to Exhibit at Semicon West 2016 in San Francisco

July 12, 2016 – Onda is pleased to exhibit at Semicon West in San Francisco from July 12-14.  Demonstrations of the award winning MCT-2000 cavitation meter will be available.

For more information about the MCT-2000, please visit HERE.

ReaderChoice

Onda’s Cavitation Meter Wins Best Monitoring/Instrumentation Product

May 16, 2016 – Onda is pleased to announce that the MCT-2000 Cavitation Meter has been voted the Best Monitoring/Instrumentation Product in Controlled Environments’ 2016 Readers’ Choice Awards.

This validates the long-standing need for a measurement solution to quantify the acoustic cavitation useful for various applications, such as ultrasonic cleaning and sonoprocessing. The MCT-2000 measures the fundamental frequency and pressures from the direct field, stable cavitation, and transient cavitation in SI units (i.e., Hz and Pa).

This announcement appeared in the May/June 2016 issue of Controlled Environments Magazine, as well as in the digital edition HERE.

For more information about the MCT-2000 cavitation meter, please visit the product page HERE.

news-SPCC2016

Onda to Present Study on Acoustic Characterization of Mask Cleaning at SPCC 2016 in San Jose, California

April 19-20, 2016 – Onda is pleased to collaborate with Honda Electronics and the Department of Materials Science and Engineering at the University of Arizona to present a study which evaluates the acoustic performance for a photomask cleaning system.

The poster is titled:

Acoustic Characterization of a Photomask Cleaning System

To download the poster, please visit the Resources page HERE.

For more information about the symposium, please visit:

https://spcc2016.com/

news-MRS

Cavitation Measurement Studies Presented at Materials Research Society in Phoenix, Arizona

March 29-31, 2016 – Onda is pleased to participate in two studies with the Department of Materials Science and Engineering at the University of Arizona.

Two studies will be presented at the Nanoparticle Characterization and Removal Symposium (NT7).

The talks are titled:

Investigations of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications

Characterization of Stable and Transient Cavitation in a Dual-Frequency Acoustic Field using a Hydrophone

To download the two talks, please visit the Resources page HERE.

For more information about the symposium, please visit: http://www.mrs.org/spring-2016-program-nt7/

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Onda Partners with Woowon Technologies to Exhibit at Semicon Korea

January 27-29, 2016 – Onda is pleased to exhibit with Woowon Technologies in booth 2272 at Semicon Korea. Onda will showcase the new MCT-2000 cavitation meter which quantifies the acoustic cavitation performance in ultrasonic cleaning.

For more information about the MCT-2000, please visit HERE to access the datasheet.

semicon-europa2015

Onda to Exhibit with PCT Systems at Semicon Europa in Dresden to Introduce a Novel Cavitation Meter

October 6-8, 2015 Onda to Exhibit with PCT Systems at Semicon Europa in Dresden to Introduce a Novel Cavitation Meter.

Onda is proud to partner with PCT Systems to demonstrate a new measurement instrument that quantifies the level of acoustic cavitation pressure for a broad range of frequencies. Please visit us in Booth 1461 to see it firsthand! We look forward to meeting with you!

Please contact us with any questions.