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SPIE_Photomask

Onda to Present Acoustic Measurements of 3 MHz Transducers for Mask Cleaning

September 12-14, 2016 – Onda is pleased to collaborate with Honda Electronics, SUSS MicroTec, and the University of Arizona to present a study which evaluates the acoustic performance for two 3 MHz transducers used for photomask megasonic cleaning.

The poster is titled:

Acoustic Characterization of Two Megasonic Devices for Photomask Cleaning
Paper 9985-74
Author(s): Claudio Zanelli, Xi Chen, Onda Corp. (United States); Manish Keswani, The Univ. of Arizona (United States); Nagaya Okada, Honda Electronics Co., Ltd. (Japan); Jyhwei Hsu, SUSS MicroTec (Taiwan) Co., Ltd. (Taiwan); Petrie H. Yam, Onda Corp. (United States)

Abstract:

New methods to measure stable and transient cavitation were applied to two megasonic cleaning devices. One is a novel design consisting of a transducer coupled to a tilted, truncated quartz cone with a 4 x 6 cm elliptical flat surface, coupled with the substrate by cleaning fluid infused through the cone. The second device is a spot shower that uses a smooth jet of cleaning fluid to convey the sound. Results of the measurements, acoustic maps and schlieren imaging are used to explain the cleaning performance of each device.

To download the poster, please visit the Resources page HERE.

For more information about the symposium, please visit HERE.

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