Onda to Present Study on Acoustic Characterization of Mask Cleaning at SPCC 2016 in San Jose, California

April 19-20, 2016 – Onda is pleased to collaborate with Honda Electronics and the Department of Materials Science and Engineering at the University of Arizona to present a study which evaluates the acoustic performance for a photomask cleaning system.

The poster is titled:

Acoustic Characterization of a Photomask Cleaning System

To download the poster, please visit the Resources page HERE.

For more information about the symposium, please visit:

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