Posts Tagged ‘Megasonic photomask cleaning’

Onda to Present Cavitation Study for a Dual Nozzle Transducer for Photomask Cleaning

Posted on: September 18th, 2017 by ondasonics No Comments

September 14, 2017 – Onda is pleased to present at the SPIE BACUS conference in Monterey, CA.  Onda shared a study on the acoustic cavitation performance from a dual (3+5 MHz) nozzle transducer for photomask cleaning.

To review the presentation material, please visit HERE.